Al2O3 - Sapphire Wafer, C-plane (0001), 10x10x0.1mm, 2SP - ALC101001S2 In 1 Mpa 50 m-torr by

1 Mpa   50 m-torr by a mechanical pump

high efficiency

two sides polished

The manual hydraulic pump is separated from the cylinder for safe operation

Battery Analyzer (Optional)

Al2O3 - Sapphire Wafer, C-plane (0001), 10x10x0.1mm, 2SP - ALC101001S2 In 1 Mpa 50 m-torr byFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 10 x 10 x 0. 1(+ 0. 05) mm thick Orientation: <0001> + 0. 5o Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 5 A two sides polished Package: Each wafer is packed in 1000 class clean room with 100 grade plastic