F02600 - SEMI F26 - グレード10/0.2　有毒特殊ガスの粒子に関する仕様 Revision:SEMI F26-0697 (Reapproved 0712) - Superseded Standardizing INAA for application to

Standardizing INAA for application to silicon will remove differences in the analytical approach and will establish a common reference for the analyses

Wafers meeting the basic specification requirements herein are suitable for use as ‘mechanical handling’ wafers for equipment set-up and robotic handling applications

This symbol is included to provide for a smooth transition from existing traceability and labeling procedures to the comprehensive

SEMI S2-0712 (technical revision)

PCS適用範囲内での主要な機能化グループの特定，

F02600 - SEMI F26 - グレード10/0.2　有毒特殊ガスの粒子に関する仕様 Revision:SEMI F26-0697 (Reapproved 0712) - Superseded Standardizing INAA for application toglobal Gases Technical Committee2012618global Audits and Reviews Subcommittee20127www. semiviews. org www. semi. org1997620033 10 0. 2 8 105 Pa 88 105 Pa 8 NH3 AsH3 PH3 Referenced SEMI Standards None.